The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 11, 2008
Filed:
Apr. 13, 2007
Zhuan Liu, Fremont, CA (US);
Yudong Hao, Santa Clara, CA (US);
YE Feng, Portland, OR (US);
Yongdong Liu, Cupertino, CA (US);
Zhuan Liu, Fremont, CA (US);
Yudong Hao, Santa Clara, CA (US);
Ye Feng, Portland, OR (US);
Yongdong Liu, Cupertino, CA (US);
Nanometrics Incorporated, Milpitas, CA (US);
Abstract
A metrology system performs optical metrology while holding a sample with an unknown focus offset. The measurements are corrected by fitting for the focus offset in a model regression analysis. Focus calibration is used to determine the optical response of the metrology device to the focus offset. The modeled data is adjusted based on the optical response to the focus offset and the model regression analysis fits for the focus offset as a variable parameter along with the sample characteristics that are to be measured. Once an adequate fit is determined, the values of the sample characteristics to be measured are reported. The adjusted modeled data may be stored in a library, or alternatively, modeled data may be adjusted in real-time.