The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 11, 2008
Filed:
Nov. 15, 2002
Water Lur, Taipei, TW;
David Lee, Hsin-chu, TW;
Kuang-chih Wang, Taichung, TW;
Ming-sheng Yang, Hsin-chu, TW;
Water Lur, Taipei, TW;
David Lee, Hsin-chu, TW;
Kuang-Chih Wang, Taichung, TW;
Ming-Sheng Yang, Hsin-chu, TW;
United Microelectronics Corporation, Hsin-Chu, TW;
Abstract
An air gap structure and formation method for substantially reducing capacitance in a dual damascene based interconnect structure is disclosed. The air gap extends above, and may also additionally extend below, the damascene interconnects desired to be isolated thus minimizing fringing fields between the lines. Multiple levels of the integrated air gap structure can be fabricated to accommodate multiple metal levels.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile