The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 11, 2008
Filed:
Dec. 14, 2005
Applicants:
Jong-an Kim, Suwon-si, KR;
Ji-haeng Han, Gunpo-si, KR;
Young-bae Jung, Suwon-si, KR;
Bae-hyoun Jung, Seongnam-si, KR;
Inventors:
Jong-An Kim, Suwon-si, KR;
Ji-Haeng Han, Gunpo-si, KR;
Young-Bae Jung, Suwon-si, KR;
Bae-Hyoun Jung, Seongnam-si, KR;
Assignee:
Samsung Electronics Co., Ltd., Suwon-si, Gyeonggi-do, KR;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 21/00 (2006.01);
U.S. Cl.
CPC ...
Abstract
An exposure mask is provided, which includes: a light blocking opaque area blocking incident light; a translucent area; and a transparent area passing the most of incident light, wherein the translucent area generates the phase differences in the range of about −70° to about +70°.