The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 28, 2008
Filed:
Aug. 11, 2006
Michael Clarke, Bedford, MA (US);
Robert F. Mcloughlin, Pelham, NH (US);
Marc Laverdiere, Wakefield, MA (US);
Michael Clarke, Bedford, MA (US);
Robert F. McLoughlin, Pelham, NH (US);
Marc Laverdiere, Wakefield, MA (US);
Entegris, Inc., Chaska, MN (US);
Abstract
Systems and methods for controlling fluid flow in an immersion lithography system. The system includes a fluid flow path that allows fluid to flow from a source through a fluid retention hood and then a fluid control valve. The system includes a pressure sensing system for determining a pressure drop across the fluid retention hood. The pressure drop across the fluid retention hood changes with the fluid flow rate. A control system receives signals indicating the pressure drop across the fluid retention hood and produces control signals for the fluid control valve. The control signals adjust the fluid flow rate through the fluid control valve to drive the flow rate to a desired rate, thereby driving the sensed pressure drop across the fluid retention hood to a desired pressure drop.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile