The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 28, 2008
Filed:
Jun. 13, 2006
Applicants:
Chia-wei Wu, Taichung, TW;
Jung-yu Shieh, Hsinchu, TW;
Ling-wuu Yang, Hsinchu, TW;
Inventors:
Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/76 (2006.01);
U.S. Cl.
CPC ...
Abstract
A process for forming STI regions comprises performing an In Situ Steam Generation (ISSG) radical conversion on a SiN liner layer within an STI trench in order to expose the top corner of the trench and simultaneously cause rounding the top corner of a liner oxide layer within the trench. The rounding of the liner oxide layer can prevent thinning of a subsequently formed gate oxide.