The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 21, 2008
Filed:
Sep. 22, 2005
Arie Jeffrey Den Boef, Waalre, NL;
Andre Bernardus Jeunink, Bergeyk, NL;
Henricus Petrus Maria Pellemans, Veldhoven, NL;
Irwan Dani Setija, Utrecht, NL;
Cas Johannes Petrus Maria Van Nuenen, Eindhoven, NL;
Stefan Carolus Jacobus Antonius Keij, Breda, NL;
Arie Jeffrey Den Boef, Waalre, NL;
Andre Bernardus Jeunink, Bergeyk, NL;
Henricus Petrus Maria Pellemans, Veldhoven, NL;
Irwan Dani Setija, Utrecht, NL;
Cas Johannes Petrus Maria Van Nuenen, Eindhoven, NL;
Stefan Carolus Jacobus Antonius Keij, Breda, NL;
ASML Netherlands B.V., Veldhoven, NL;
Abstract
A lithographic apparatus according to one embodiment includes an alignment system for aligning a substrate. The alignment system comprises an illuminator system configured to illuminate an alignment mark on the substrate with an illumination spot, the alignment mark comprising a plurality of lines and spaces. The system also includes a combiner system configured to transfer two images of the illuminated alignment mark without spatial filtering of the images, rotate the images 180° relatively to each other, and combine the two images; and a detection system configured to detect an alignment signal from the combined images and to determine a unique alignment position by selecting a specific one of extreme values in the detected alignment signal.