The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 21, 2008
Filed:
Oct. 04, 2004
Masahito Hiroshima, Tokyo, JP;
Masahito Hiroshima, Tokyo, JP;
Elpida Memory, Inc., Tokyo, JP;
Abstract
In a method of manufacturing a semiconductor device including a wiring pattern in the form of a linear line having an intermediate portion with a locally different line width, the wiring pattern being formed by using a resist pattern, the resist pattern is formed through an exposure step using a mask pattern prepared by dividing the wiring pattern in a mask into a simple line portion and a rectangular pattern portion having a different line width, and interposing between the line portion and the rectangular pattern portion a slit having a predetermined separation width of not larger than 0.22×λ/NA (λ represents a wavelength of exposure light, and NA represents a numerical aperture of a projection lens).