The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 07, 2008
Filed:
Aug. 24, 2004
Applicant:
Roland Pieter Stolk, Sprang-Capelle, NL;
Inventor:
Roland Pieter Stolk, Sprang-Capelle, NL;
Assignee:
ASML Netherlands B.V., Veldhoven, NL;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G02B 5/04 (2006.01);
U.S. Cl.
CPC ...
Abstract
A variable attenuator is provided for selectively attenuating a radiation beam in a lithographic apparatus. The attenuator is generally planar and comprises two wedge shaped prisms formed of refractive material located adjacent to each other, arranged so that the radiation beam passes through both prisms. The attenuator is rotatable to vary the angle at which radiation strikes the prisms, thus varying the transmission at each surface.
Stolk, Roland. (2008). Variable attenuator for a lithographic apparatus (U.S. Patent No. 7433139). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/7433139
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile