The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 07, 2008
Filed:
Oct. 28, 2004
James J. Xu, San Jose, CA (US);
Ken K. Lee, Los Altos, CA (US);
James J. Xu, San Jose, CA (US);
Ken K. Lee, Los Altos, CA (US);
Core Tech Optical, Inc., San Jose, CA (US);
Abstract
A defect review system includes a stage, a light source, a turning mirror, and a ring of collectors. The stage supports and moves an article for inspection, the article having a surface. The light source provides light. The turning mirror turns the light toward the surface at an oblique incident angle whereby the light illuminates a spot on the surface and the light scatters from the spot. The ring of collectors is adapted to collect scattering light. A method of reviewing surface of a wafer is disclosed. The method provides a dark-field mode of operation adapted to inspect the surface by illuminating a spot on the surface at an oblique angle and collecting scattering light from the surface. Further, the method provides a bright-field mode of operation adapted to inspect the surface by illuminating a spot on the surface at a normal angle to examine the reflecting light.