The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 07, 2008

Filed:

Jun. 12, 2007
Applicants:

Norikazu Mizuno, Nakano-ku, JP;

Kiyohiko Maeda, Nakano-ku, JP;

Inventors:

Norikazu Mizuno, Nakano-ku, JP;

Kiyohiko Maeda, Nakano-ku, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/318 (2006.01); H01L 21/3105 (2006.01); H01L 21/314 (2006.01);
U.S. Cl.
CPC ...
Abstract

A semiconductor device manufacturing method comprises a first step of forming, by a thermal chemical vapor deposition method, a silicon nitride film on an object disposed in a reaction container, with bis tertiary butyl amino silane and NHflowing into the reaction container, and a second step of removing silicon nitride formed in the reaction container, with NFgas flowing into the reaction container.


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