The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 07, 2008
Filed:
Aug. 26, 2005
Akihiro Hosokawa, Cupertino, CA (US);
Makoto Inagawa, Palo Alto, CA (US);
Hienminh Huu Le, San Jose, CA (US);
John M. White, Hayward, CA (US);
Akihiro Hosokawa, Cupertino, CA (US);
Makoto Inagawa, Palo Alto, CA (US);
Hienminh Huu Le, San Jose, CA (US);
John M. White, Hayward, CA (US);
Applied Materials, Inc., Santa Clara, CA (US);
Abstract
A method for making a film stack containing one or more metal-containing layers and a substrate processing system for forming the film stack on a substrate are provided. The substrate processing system includes at least one transfer chamber coupled to at least one load lock chamber, at least one first physical vapor deposition (PVD) chamber configured to deposit a first material layer on a substrate, and at least one second PVD chamber for in-situ deposition of a second material layer over the first material layer within the same substrate processing system without breaking the vacuum or taking the substrate out of the substrate processing system to prevent surface contamination, oxidation, etc. The substrate processing system is configured to provide high throughput and compact footprint for in-situ sputtering of different material layers in designated PVD chambers.