The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 07, 2008
Filed:
Nov. 14, 2003
Donggyun Han, Yongin-si, KR;
Woosung Han, Seoul, KR;
Changki Hong, Seongnam-si, KR;
Sangjun Choi, Seoul, KR;
Hyungho Ko, Seoul, KR;
Hyosan Lee, Suwon-si, KR;
Donggyun Han, Yongin-si, KR;
Woosung Han, Seoul, KR;
Changki Hong, Seongnam-si, KR;
Sangjun Choi, Seoul, KR;
Hyungho Ko, Seoul, KR;
Hyosan Lee, Suwon-si, KR;
Samsung Electronics Co., Ltd., Gyeonggi-do, KR;
Abstract
An apparatus and method for removing photoresist from a substrate, which includes treating the photoresist with a first reactant to cause swelling, cracking or delamination of the photoresist, treating the photoresist with a second reactant to chemically alter the photoresist, and subsequently removing the chemically altered photoresist with a third reactant. In one example, the first reactant is supercritical carbon dioxide (SCCO), the second reactant is ozone vapor, and the third reactant is deionized water.