The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 7429530 B1

PDF
Full Text
Expired
Date of Patent:
Sep. 30, 2008

Filed:

Sep. 21, 2005
Applicants:

Katsuyuki Moriya, Nagano, JP;

Toshimitsu Hirai, Nagano, JP;

Inventors:

Katsuyuki Moriya, Nagano, JP;

Toshimitsu Hirai, Nagano, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/44 (2006.01);
U.S. Cl.
CPC ...
Abstract

A method of forming a pattern of a functional layer on a surface of a substrate, where a pattern region, to which the pattern is provided, is edged with a boundary layer, and has a first region and a second region communicated with the first region and having a narrower width than the first region, the method includes: providing an intermediate layer having adhesiveness with the substrate and lyophilicity with a functional fluid to the first and the second regions; ejecting a droplet of the functional fluid to the first region; and allowing the droplet of the functional fluid ejected to the first region to automatically flow to the second region with the lyophilicity with the intermediate layer.


Find Patent Forward Citations

Moriya, Katsuyuki. (2008). Method of forming a pattern, method of forming wiring, semiconductor device, tft device, electro-optic device, and electronic instrument (U.S. Patent No. 7429530). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/7429530

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