The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 23, 2008
Filed:
Sep. 01, 2004
Applicants:
Jeroen Jonkers, Aachen, DE;
Dominik Marcel Vaudrevange, Aachen, DE;
Willi Neff, Kelmis, DE;
Inventors:
Assignee:
Koninklijke Philips Electronics N.V., Eindhoven, NL;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
A61N 5/06 (2006.01); G01J 3/10 (2006.01); H05G 2/00 (2006.01);
U.S. Cl.
CPC ...
Abstract
A method of producing extreme ultraviolet radiation (EUV) or soft X-ray radiation by means of an electrically operated discharge, in particular for EUV lithography or for metrology, in which a plasma () is ignited in a gaseous medium between at least two electrodes () in a discharge space (), said plasma emitting said radiation that is to be produced. The gaseous medium is produced from a metal melt (), which is applied to a surface in said discharge space () and at least partially evaporated by an energy beam, in particular by a laser beam ().