The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 23, 2008
Filed:
Feb. 23, 2006
Tza-hao Wang, Taoyuan County, TW;
Jin-yang Huang, Taipei County, TW;
Hung-kwei Liao, Taoyuan, TW;
Ming-sheng Tung, Hsinchu, TW;
Tza-Hao Wang, Taoyuan County, TW;
Jin-Yang Huang, Taipei County, TW;
Hung-Kwei Liao, Taoyuan, TW;
Ming-Sheng Tung, Hsinchu, TW;
ProMOS Technologies Inc., Hsinchu, TW;
Abstract
A metal etching process is described. A substrate having a dielectric layer thereon is provided. An aluminum-copper alloy layer is formed on the dielectric layer. A hard mask layer is formed on the aluminum-copper alloy layer. A patterned photoresist layer is formed on the hard mask layer and then the hard mask layer is patterned. A thermal treatment process is performed. The thermal treatment process is carried out at a temperature of more than 300° C. for a period of at least 3 minutes. Thereafter, the aluminum-copper alloy layer is etched using the patterned hard mask layer as an etching mask. Due to the thermal treatment, the metal precipitate (CuAl) within the aluminum-copper alloy layer is eliminated and hence the metal etching process is improved.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile