The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 23, 2008

Filed:

Dec. 09, 2005
Applicants:

Kevin Matthew Durocher, Waterford, NY (US);

Stacey Joy Goodwin, Niskayuna, NY (US);

Ernest Wayne Balch, Ballston Spa, NY (US);

Christopher James Kapusta, Delanson, NY (US);

Inventors:

Kevin Matthew Durocher, Waterford, NY (US);

Stacey Joy Goodwin, Niskayuna, NY (US);

Ernest Wayne Balch, Ballston Spa, NY (US);

Christopher James Kapusta, Delanson, NY (US);

Assignee:

General Electric Company, Niskayuna, NY (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 21/302 (2006.01);
U.S. Cl.
CPC ...
Abstract

A method is provided. The method includes forming a conductive layer on an inner surface of a substrate and providing a sacrificial layer over the conductive layer. The method includes forming a plurality of channels in the sacrificial layer and plating the sacrificial layer to substantially fill the plurality of channels with a plating material comprising conducting material. The method also includes etching the sacrificial layer to form a conducting structure having fins where conducting material remains separated by microchannels where the sacrificial layer is etched.


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