The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 7426016 B1

Expired

Date of Patent:

Sep. 16, 2008

Filed:

Nov. 16, 2007

Exposure apparatus and exposure method

Applicants:

Noritoshi Takada, Toyama, JP;

Seiji Tanaka, Toyama, JP;

Kenji Noda, Toyama, JP;

Hidekazu Kitahara, Toyama, JP;

Inventors:

Noritoshi Takada, Toyama, JP;

Seiji Tanaka, Toyama, JP;

Kenji Noda, Toyama, JP;

Hidekazu Kitahara, Toyama, JP;

Assignee:

Matsushita Electric Industrial Co., Ltd., Osaka, JP;

Attorney:

McDermott Will & Emery LLP

Primary Examiner:

Hung Henry Nguyen

Int. Cl.

CPC ...

G03B 27/42 (2006.01); G03B 27/52 (2006.01);

U.S. Cl.

CPC ...

Abstract

According to an exposure apparatus and an exposure method in the present invention, based on a focus value and a leveling value in each exposure shot calculated based on measurements by a focus sensor, differential absolute value for respective value are calculated. The differential absolute values for the focus values and leveling vaule are compared with predetermined threshold vaule for the respective differential absolute values. When the differential absolute values exceed the threshold value, it is determined that an exposure abnormality exists. In such case, based at least the number of exposure area where the exposure abnormality is occurred and distribution of the exposure area where the exposure abnormality is occurred on the object to be exposed, a kind of the exposure abnormality is identifed. The detection of the exposure abnormality is assured, and a cause of the abnormality is determined without lowering manufacturing capabilities and increasing in cost.

Find Patent Forward Citations

Takada, Noritoshi. (2008). Exposure apparatus and exposure method (U.S. Patent No. 7426016). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/7426016

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