The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 09, 2008
Filed:
Jan. 25, 2005
Michael Totzeck, Schwabisch Gmund, DE;
Bernd Peter Geh, Scottsdale, AZ (US);
Skip Miller, Phoenix, AZ (US);
Michael Totzeck, Schwabisch Gmund, DE;
Bernd Peter Geh, Scottsdale, AZ (US);
Skip Miller, Phoenix, AZ (US);
ASML Netherlands B.V., , NL;
Abstract
A lithographic apparatus includes a support structure configured to hold a patterning device, the patterning device configured to pattern a beam of radiation according to a desired pattern, a substrate table configured to hold a substrate and a projection system configured to project the beam as patterned onto a target portion of the substrate. The lithographic apparatus further includes a polarization modifier disposed in a path of the beam. The polarization modifier comprises a material having a radially varying birefringence.