The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 09, 2008

Filed:

Mar. 14, 2006
Applicants:

Alexander S. Perel, Danvers, MA (US);

Phil J. Ring, Beverly, MA (US);

Ronald A. Capodilupo, Beverly, MA (US);

Michael A. Graf, Belmont, MA (US);

Inventors:

Alexander S. Perel, Danvers, MA (US);

Phil J. Ring, Beverly, MA (US);

Ronald A. Capodilupo, Beverly, MA (US);

Michael A. Graf, Belmont, MA (US);

Assignee:

Axcelis Technologies, Inc., Beverly, MA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/317 (2006.01); H01J 49/10 (2006.01);
U.S. Cl.
CPC ...
Abstract

An image monitor system monitors characteristics of an ion beam employed in ion implantation. The monitored characteristics can include particle count, particle information, beam current intensity, beam shape, and the like. The system includes one or more image sensors that capture frames or images along a beam path of an ion beam. An image analyzer analyzes the captured frames to obtain measured characteristics. A controller determines adjustments or corrections according to the measured characteristics and desired beam characteristics.


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