The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 09, 2008
Filed:
Aug. 28, 2003
Tianniu Chen, Rocky Hill, CT (US);
Chongying Xu, New Milford, CT (US);
Thomas H. Baum, New Fairfield, CT (US);
Ravi K. Laxman, San Jose, CA (US);
Alexander S. Borovik, W. Hartford, CT (US);
Tianniu Chen, Rocky Hill, CT (US);
Chongying Xu, New Milford, CT (US);
Thomas H. Baum, New Fairfield, CT (US);
Ravi K. Laxman, San Jose, CA (US);
Alexander S. Borovik, W. Hartford, CT (US);
Advanced Technology Materials, Inc., Danbury, CT (US);
Abstract
A siloxane dielectric precursor for use in a chemical vapor deposition (CVD) process, which has been dosed with a stabilizing agent(s) selected from free-radical inhibitors, end-capping agents and mixtures thereof. The stabilized siloxane dielectric precursor reduces the occurrence of premature deposition reactions occurring in the heated environment of the CVD delivery lines and process hardware.