The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 09, 2008

Filed:

Nov. 21, 2006
Applicants:

Xiangfeng Duan, Mountain View, CA (US);

R. Hugh Daniels, Mountain View, CA (US);

Chunming Niu, Palo Alto, CA (US);

Vijendra Sahi, Menlo Park, CA (US);

James M. Hamilton, Sunnyvale, CA (US);

Linda T. Romano, Sunnyvale, CA (US);

Inventors:

Xiangfeng Duan, Mountain View, CA (US);

R. Hugh Daniels, Mountain View, CA (US);

Chunming Niu, Palo Alto, CA (US);

Vijendra Sahi, Menlo Park, CA (US);

James M. Hamilton, Sunnyvale, CA (US);

Linda T. Romano, Sunnyvale, CA (US);

Assignee:

Nanosys, Inc., Palo Alto, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/44 (2006.01); H01L 21/441 (2006.01);
U.S. Cl.
CPC ...
Abstract

Methods of positioning and orienting nanostructures, and particularly nanowires, on surfaces for subsequent use or integration. The methods utilize mask based processes alone or in combination with flow based alignment of the nanostructures to provide oriented and positioned nanostructures on surfaces. Also provided are populations of positioned and/or oriented nanostructures, devices that include populations of positioned and/or oriented nanostructures, systems for positioning and/or orienting nanostructures, and related devices, systems and methods.


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