The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 02, 2008
Filed:
Sep. 01, 2005
Thomas M. Graettinger, Boise, ID (US);
John K. Zahurak, Boise, ID (US);
Shane J. Trapp, Boise, ID (US);
Thomas Arthur Figura, Boise, ID (US);
Thomas M. Graettinger, Boise, ID (US);
John K. Zahurak, Boise, ID (US);
Shane J. Trapp, Boise, ID (US);
Thomas Arthur Figura, Boise, ID (US);
Micron Technology, Inc., Boise, ID (US);
Abstract
This invention includes methods of forming openings into dielectric material. In one implementation, an opening is partially etched through dielectric material, with such opening comprising a lowest point and opposing sidewalls of the dielectric material. At least respective portions of the opposing sidewalls within the opening are lined with an electrically conductive material. With such electrically conductive material over said respective portions within the opening, plasma etching is conducted into and through the lowest point of the dielectric material of the opening to extend the opening deeper within the dielectric material. Other aspects and implementations are contemplated.