The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 02, 2008

Filed:

Jul. 31, 2006
Applicant:

Nobuyuki Kato, Shizuoka, JP;

Inventor:

Nobuyuki Kato, Shizuoka, JP;

Assignee:

Ulvac Inc., Chigasaki-shi, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/4763 (2006.01);
U.S. Cl.
CPC ...
Abstract

In the present invention, a barrier filmis formed by forming a tungsten nitride filmand subsequently by forming a tungsten silicide film. The tungsten silicide filmis exposed at the surface of the barrier film, and an electrode film' is formed so as to be brought into close contact with the tungsten silicide film. Since a conductive material constituting the electrode film′ is chemically bound to silicon atoms in the tungsten silicide film, the adhesion between the barrier filmand the electrode film′ is high, and the electrode film′ resists peeling from the barrier film. Further, agglomeration is not likely to occur in the electrode film′ during annealing.


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