The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 19, 2008

Filed:

Jun. 10, 2004
Applicants:

Hiroaki Inoue, Tokyo, JP;

Akira Susaki, Tokyo, JP;

Inventors:

Hiroaki Inoue, Tokyo, JP;

Akira Susaki, Tokyo, JP;

Assignee:

Ebara Corporation, Tokyo, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/44 (2006.01);
U.S. Cl.
CPC ...
Abstract

The present invention provides a plating method and a plating apparatus which can securely form a metal film (protective film) by electroless plating on the exposed surfaces of a base metal, such as interconnects without the formation of voids in the base metal. The plating method including providing a semiconductor device having an embedded interconnect structure, carrying out pretreatment of interconnects with a pre-treatment liquid containing a surface activating agent for the interconnects, carrying out catalytic treatment of the interconnects with a catalytic treatment liquid containing catalyst metal ions and an excessive etching inhibitor for the interconnects, and forming a protective film by electroless plating selectively on the surfaces of the interconnects.


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