The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 7413924 B1

PDF
Full Text
Expired
Date of Patent:
Aug. 19, 2008

Filed:

Oct. 31, 2005
Applicants:

Donald F. Weston, Phoenix, AZ (US);

William J. Dauksher, Mesa, AZ (US);

Emmett M. Howard, Gilbert, AZ (US);

Inventors:

Donald F. Weston, Phoenix, AZ (US);

William J. Dauksher, Mesa, AZ (US);

Emmett M. Howard, Gilbert, AZ (US);

Assignee:

Motorola, Inc., Schaumburg, IL (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 51/40 (2006.01);
U.S. Cl.
CPC ...
Abstract

A process for forming a catalyst layer for carbon nanotube growth comprising forming a catalyst layer having a first and second portion over one of a cathode metal layer or a ballast resistor layer; patterning a photoresist over the first portion; etching the second portion with a chlorine/argon plasma; removing the photoresist with an ash process; and removing the veils and preparing the surface for carbon nanotube growth with a semi-aqueous hydroxylamine solution.


Find Patent Forward Citations

Weston, Donald. (2008). Plasma etch process for defining catalyst pads on nanoemissive displays (U.S. Patent No. 7413924). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/7413924

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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