The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 12, 2008
Filed:
May. 27, 2004
Applicants:
Toshihiro Ushiyama, Chimo, JP;
Toshimitsu Hirai, Chino, JP;
Toshiaki Mikoshiba, Suwa, JP;
Hiroshi Kiguchi, Suwa, JP;
Hironori Hasei, Okaya, JP;
Inventors:
Toshihiro Ushiyama, Chimo, JP;
Toshimitsu Hirai, Chino, JP;
Toshiaki Mikoshiba, Suwa, JP;
Hiroshi Kiguchi, Suwa, JP;
Hironori Hasei, Okaya, JP;
Assignee:
Seiko Epson Corporation, Tokyo, JP;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 21/30 (2006.01); B05D 7/00 (2006.01); B41J 2/01 (2006.01);
U.S. Cl.
CPC ...
Abstract
A method for fabricating a thin film pattern on a substrate, includes the steps of: forming a concave part on the substrate that conforms to the thin film pattern; and applying a function liquid into the concave part.
Ushiyama, Toshihiro. (2008). Method for fabricating thin film pattern, device and fabricating method therefor, method for fabricating liquid crystal display, liquid crystal display, method for fabricating active matrix substrate, electro-optical apparatus, and electrical apparatus (U.S. Patent No. 7410905). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/7410905
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile