The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 12, 2008
Filed:
Feb. 16, 2005
Applicants:
Tarek Lutz, München, DE;
Jens Schneider, München, DE;
Inventors:
Tarek Lutz, München, DE;
Jens Schneider, München, DE;
Assignee:
Infineon Technologies AG, Munich, DE;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 1/00 (2006.01);
U.S. Cl.
CPC ...
Abstract
In a process for producing a mask, layout data is provided for a semiconductor layout. The layout data is fractionated to create control data for a pattern generator. Slivers are identified slivers from the fractionating step. Second control data can be created from an enlarged imaging of the slivers. A first exposure can then be carried out using the control data and a second exposure can be carried out using the second data. The second exposure is carried out with a lower exposure dose as compared to the first exposure.