The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 05, 2008
Filed:
Sep. 09, 2005
Sayaka Tanimoto, Kodaira, JP;
Yasunari Soda, Kawasaki, JP;
Masakazu Sugaya, Inagi, JP;
Hiroshi Tooyama, Hachioji, JP;
Takeshi Tsutsumi, Hitachinaka, JP;
Yasuhiro Someda, Tochigi, JP;
Sayaka Tanimoto, Kodaira, JP;
Yasunari Soda, Kawasaki, JP;
Masakazu Sugaya, Inagi, JP;
Hiroshi Tooyama, Hachioji, JP;
Takeshi Tsutsumi, Hitachinaka, JP;
Yasuhiro Someda, Tochigi, JP;
Hitachi High-Technologies Corporation, Tokyo, JP;
Canon Kabushiki Kaisha, Tokyo, JP;
Abstract
During the writing operation, the wafer potential is dynamically detected and corrected. By doing so, the positional accuracy of the circuit patterns written on a wafer can be improved. After a contact resistance between a wafer and a earth pin is measured, the current flowing from the wafer to the ground potential via the earth pin is measured. Then, based on the measurement result, the potential difference is given between the wafer and the ground potential.