The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 05, 2008
Filed:
Jun. 30, 2005
Raimond Visser, Best, NL;
Raimond Visser, Best, NL;
ASML Netherlands B.V., Veldhoven, NL;
Abstract
A method for aligning a substrate in a lithographic apparatus includes determining from a geometric reference of the substrate a position of a window on the substrate. The window indicates an area in which an alignment mark of the substrate may be expected. Then, a position of the alignment mark is measured in the window. A relationship between the measured position of the alignment mark and the position of the window is determined. The relationship is stored in a database and the substrate is aligned making use of the measured position of the alignment mark. The above may be repeated for a following aligning of the substrate, prior however to the measuring of the position of the alignment mark in the window, the position of the window is amended making use of the relationship between the measured position of the alignment mark and the position of the window as stored in the database for one or more preceding alignings.