The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 05, 2008
Filed:
Apr. 03, 2007
Applicants:
Ming-cheng Chang, Tao-Yuan Hsien, TW;
Neng-tai Shih, Taipei, TW;
Inventors:
Ming-Cheng Chang, Tao-Yuan Hsien, TW;
Neng-Tai Shih, Taipei, TW;
Assignee:
Nanya Technology Corp., Kueishan, Tao-Yuan Hsien, TW;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 27/108 (2006.01); H01L 29/76 (2006.01); H01L 29/94 (2006.01); H01L 31/119 (2006.01);
U.S. Cl.
CPC ...
Abstract
A DRAM structure on a silicon substrate has an active area, gate conductors, deep trench capacitors, and vertical transistors. The deep trench capacitors are formed at intersections of the active area and the gate conductors, and each deep trench capacitor is coupled electrically to the corresponding vertical transistor to form a memory cell. The transistor includes a gate, a source in a lateral side of the gate, and a drain in another lateral side of the gate The depth of the drain is different from the depth of the source.