The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 05, 2008
Filed:
Oct. 23, 2006
Masuhiro Natsuhara, Itami, JP;
Hirohiko Nakata, Itami, JP;
Akira Kuibira, Itami, JP;
Manabu Hashikura, Itami, JP;
Masuhiro Natsuhara, Itami, JP;
Hirohiko Nakata, Itami, JP;
Akira Kuibira, Itami, JP;
Manabu Hashikura, Itami, JP;
Sumitomo Electric Industries, Ltd., Osaka, JP;
Abstract
A wafer holder is provided in which local heat radiation in supporting and heating wafers is kept under control and temperature uniformity of the wafer retaining surface is enhanced, and by making use of the wafer holder a semiconductor manufacturing apparatus suitable for processing larger-diameter wafers is made available. In a wafer holder () including within a ceramic substrate () a resistive heating element () or the like and being furnished with a lead () penetrating a reaction chamber (), the lead () is housed in a tubular guide member (), and an interval between the guide member () and the reaction chamber () as well as the interior of the guide member () are hermetically sealed. The guide member () and the ceramic substrate () are not joined together, and in the interior of the guide member () in which the inside is hermetically sealed, the atmosphere toward the ceramic substrate () is preferably substantially the same as the atmosphere in the reaction chamber ().