The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 05, 2008
Filed:
Sep. 29, 2005
Applicant:
Kazuyuki Nitta, Kawasaki, JP;
Inventor:
Kazuyuki Nitta, Kawasaki, JP;
Assignee:
Tokyo Ohka Kogyo Co., Ltd., Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/32 (2006.01);
U.S. Cl.
CPC ...
Abstract
A resist developer capable of forming a high resolution resist pattern with good shape and little film thinning is provided, together with a resist pattern formation method using such a developer. The resist developer is an aqueous solution comprising an ammonium hydroxide represented by a general formula (I): RRN.OHwherein Ris a lower alkyl group in which the number of carbon atoms is A, Ris a lower alkyl group in which the number of carbon atoms is B, A<B, and n is an integer from 1 to 3.
Nitta, Kazuyuki. (2008). Resist developer and resist pattern formation method using same (U.S. Patent No. 7407739). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/7407739
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