The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 29, 2008
Filed:
Feb. 22, 2005
Wataru Machiyama, Kai, JP;
Wataru Machiyama, Kai, JP;
Tokyo Elctron Limited, Tokyo, JP;
Abstract
A dummy substrate () differs from a substrate to be processed in having a first guide (G) for assisting centering, however, it can be handled as a substitute of the substrate to be processed. In a process chamber (), a second guide (G) is arranged to assist the dummy substrate () to center. To detect a transfer shift of a transfer mechanism (TRM), at first, the dummy substrate () is centered to a placing table () on the placing table () or at an upper position thereof by engagement of the first and the second guides (G, G). The dummy substrate () centered in such a manner is received by the transfer mechanism (TRM) and transferred to a detector (). Then, a detection value of a decentering quantity and that in a decentering direction of the dummy substrate () are obtained by the detector (), and a transfer shift of the transfer mechanism (TRM) is obtained based on the detection values.