The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 22, 2008
Filed:
Nov. 04, 2005
Hiroyuki Iwaki, Tokyo, JP;
Hiroyuki Iwaki, Tokyo, JP;
Tokyo Electron Limited, Tokyo, JP;
Abstract
A heat treatment device for baking a chemically amplified resist film formed on a substrate after exposure but before development includes a table that supports the substrate, a heater that heats the substrate, a magnetic field generating unit that generates a magnetic field of lines of magnetic flux directed in a film thickness direction of the resist film and reverses the direction of the lines of magnetic flux, and a controller unit that controls the magnetic field generating unit to generate the magnetic field acting on the resist film at least while the substrate is being heated by the heater unit.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile