The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 22, 2008

Filed:

Jan. 24, 2005
Applicants:

Tsutomu Ogihara, Niigata-ken, JP;

Fujio Yagihashi, Niigata-ken, JP;

Yoshitaka Hamada, Niigata-ken, JP;

Takeshi Anaso, Niigata-ken, JP;

Motoaki Iwabuchi, Niigata-ken, JP;

Masaru Sasago, Hirakata, JP;

Hideo Nakagawa, Oumihachiman, JP;

Inventors:

Tsutomu Ogihara, Niigata-ken, JP;

Fujio Yagihashi, Niigata-ken, JP;

Yoshitaka Hamada, Niigata-ken, JP;

Takeshi Anaso, Niigata-ken, JP;

Motoaki Iwabuchi, Niigata-ken, JP;

Masaru Sasago, Hirakata, JP;

Hideo Nakagawa, Oumihachiman, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C08G 77/06 (2006.01);
U.S. Cl.
CPC ...
Abstract

The invention provides a coating solution for forming a porous film having excellent mechanical strength and dielectric properties and for easily forming a film with a freely controlled film thickness in an ordinarily employed method in semiconductor process. More specifically, provided are a method for preparing a porous-film-forming composition comprising steps of preparing polysiloxane, silica or zeolite particles (Component A), imparting crosslinkability to Component A, and temporarily terminating the crosslinkability; and a porous-film-forming composition obtainable in this method. In addition, provided is a method of forming a porous film comprising steps of preparing a porous-film-forming composition by preparing Component A, imparting crosslinkability to Component A and adding a crosslinkability inhibitor to temporarily terminate the crosslinkability; applying the porous-film-forming composition onto a substrate to form a film, drying the film, crosslinking the particles along with removing the crosslinkability inhibitor by heating the dried film.


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