The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 08, 2008

Filed:

Nov. 15, 2005
Applicants:

Takahiro Inoue, Nagano, JP;

Hiroaki Samizu, Nagano, JP;

Inventors:

Takahiro Inoue, Nagano, JP;

Hiroaki Samizu, Nagano, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03B 27/54 (2006.01);
U.S. Cl.
CPC ...
Abstract

An exposure apparatus for performing direct exposure on a relatively moving exposure target substrate comprises: a plurality of exposure heads arranged so that an overlapping exposed area occurs between exposed areas formed on the exposure target substrate as a result of exposure by the exposure heads; and light adjusting means for adjusting the amount of light to be projected from two adjacent exposure heads onto the overlapping exposed area so that the amount of the projected light becomes equal to the amount of light that a single exposure head would project onto an exposure area if the exposure area were to be exposed through the same pattern by the single exposure head alone.


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