The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 08, 2008

Filed:

Apr. 12, 2002
Applicant:

Koji Okada, Osaka, JP;

Inventor:

Koji Okada, Osaka, JP;

Assignee:

Kaneka Corporation, Osaka, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C08G 69/26 (2006.01); C08G 69/08 (2006.01);
U.S. Cl.
CPC ...
Abstract

The present invention relates to a novel diamine, a novel acid dianhydride, and a novel composition containing a polyimide produced from such diamine and acid dianhydride. Specifically, the present invention relates to an acid dianhydride that has a photosensitive group bonded through the mediation of an alkylene group or a fluoroalkylene group, a diamine that has a reactive group bonded through the mediation of an alkylene group or a fluoroalkylene group, and a polyimide composition that contains a novel polyimide having at least one of such acid dianhydride residue and diamine residue in a molecule thereof. Particularly, an object of the present invention is to provide a novel polyimide that has both photoreactivity and thermoreactivity specific to the reactive group and whose reactive group is selected from the group consisting of: organic groups derived from cinnamic acid, chalcone, furylacryloyl, benzalacetophenone, stilbene, coumarin, and pyrone; allyl; propargyl; ethinyl; CH═CH—; CH═C(CH)—; and skeletons derived therefrom, and it to provide a novel diamine and a novel acid dianhydride that may be contained in the polyimide composition.


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