The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 01, 2008
Filed:
Oct. 21, 2004
Jan Jaap Kuit, Veldhoven, NL;
Jan Frederik Hoogkamp, Breda, NL;
Hubert Marie Segers, 'S-Hertogenbosch, NL;
Raimond Visser, Best, NL;
Johannes Maquine, Geldrop, NL;
Jan Jaap Kuit, Veldhoven, NL;
Jan Frederik Hoogkamp, Breda, NL;
Hubert Marie Segers, 'S-Hertogenbosch, NL;
Raimond Visser, Best, NL;
Johannes Maquine, Geldrop, NL;
ASML Netherlands B.V., Veldhoven, NL;
Abstract
The present invention provides a lithographic apparatus including an illumination system configured to condition a radiation beam; a patterning device support constructed to support a patterning device, the patterning device placed on the patterning device support being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam; a substrate table constructed to hold a substrate; a projection system configured to project the patterned radiation beam onto a target portion of the substrate, and a patterning device handling apparatus, including a single robot for exchanging a patterning device with the patterning device support and a loading station, wherein the robot includes a first holding device configured to hold a patterning device in a first holding position and a second holding device configured to hold a patterning device in a second holding position. Such single robot makes a rapid and accurate exchange of patterning devices possible.