The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 01, 2008
Filed:
Mar. 11, 2004
Albert Jan Hendrik Klomp, Eindhoven, NL;
Jan Frederik Hoogkamp, Breda, NL;
Raimond Visser, Best, NL;
Josephus Cornelius Johannes Antonius Vugts, Waalwijk, NL;
Henricus Johannes Louis Marie Vullings, North Ryde, AU;
Leo Wilhelmus Maria Kuipers, Eindhoven, NL;
Johannes Hendrikus Gertrudis Franssen, Eersel, NL;
Albert Jan Hendrik Klomp, Eindhoven, NL;
Jan Frederik Hoogkamp, Breda, NL;
Raimond Visser, Best, NL;
Josephus Cornelius Johannes Antonius Vugts, Waalwijk, NL;
Henricus Johannes Louis Marie Vullings, North Ryde, AU;
Leo Wilhelmus Maria Kuipers, Eindhoven, NL;
Johannes Hendrikus Gertrudis Franssen, Eersel, NL;
ASML Netherlands B.V., Veldhoven, NL;
Abstract
A load lock for a lithographic apparatus is arranged to transfer an object, like a substrate, into and from the lithographic apparatus. The load lock outer wall defining at least part of a load lock volume accommodating a support unit for supporting the object when in the load lock. The load lock also has a temperature conditioned structure to control the temperature of the object to a desired temperature at least before the object is transferred from the load lock towards the lithographic projection apparatus.