The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 01, 2008

Filed:

Jul. 12, 2005
Applicants:

Akira Kuibira, Itami, JP;

Masuhiro Natsuhara, Itami, JP;

Hirohiko Nakata, Itami, JP;

Inventors:

Akira Kuibira, Itami, JP;

Masuhiro Natsuhara, Itami, JP;

Hirohiko Nakata, Itami, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H05B 3/68 (2006.01);
U.S. Cl.
CPC ...
Abstract

Ceramic susceptor whose wafer-retaining face has superior isothermal properties, and that is suited to utilization in apparatuses for manufacturing semiconductors and in liquid-crystal manufacturing apparatuses. In plate-shaped sintered ceramic body, resistive heating elementis formed. Fluctuation in pullback length L between sintered ceramic body outer-peripheral edgeand resistive heating element substantive-domain outer-peripheral edgeis within ±0.8%, while isothermal rating of the entire surface of the wafer-retaining face is ±1.0% or less. Preferable is a superior isothermal rating of ±0.5% or less that can be achieved by bringing the fluctuation in pullback length L to within ±0.5%.


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