The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 01, 2008
Filed:
May. 07, 2004
Yuji Yamaguchi, San Antonio, TX (US);
Yuji Yamaguchi, San Antonio, TX (US);
Other;
Abstract
There is a structure and method for measuring the lengths of lines and spaces in semiconductor process. In an example embodiment, a lithographic structure () comprises, a frame (). The frame includes a top inside edge, a top outside edge, a bottom inside edge, a bottom outside edge, a left inside edge, a left outside edge, a right inside edge, and a right outside edge. There is a first array of lines () and spaces, the first array having end of lines () and end of spaces (). The lines have a first line width and the spaces have a first space width; the end of spaces are at a first distance () from the top outside edge of the frame (), the end of lines are at a second distance () from the top outside edge of the frame (). A first opening () is a third distance () from the bottom outside edge of the frame and a second opening () is a fourth distance () from the bottom outside edge of the frame.