The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 24, 2008

Filed:

Jan. 26, 2006
Applicants:

Raphael Ben-tulila, Kiryat-Gat, IL;

Emil Berladsky, Rehovot, IL;

Ilya Leizerson, Rehovot, IL;

Ofer Saphier, Rehovot, IL;

Inventors:

Raphael Ben-Tulila, Kiryat-Gat, IL;

Emil Berladsky, Rehovot, IL;

Ilya Leizerson, Rehovot, IL;

Ofer Saphier, Rehovot, IL;

Assignee:

Orbotech Ltd, Yavne, IL;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01N 21/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

An inspection system operative to inspect patterned devices having microscopic conductors, the system comprising a camera viewing a location of a candidate defect on a patterned substrate and acquiring thereat at least one image of the location, the camera defining an optical axis, the at least one image being illuminated by at least one illumination offset from the optical axis, the illumination being supplied along at least first and second axes of illumination that are mutually non-parallel in a plane corresponding to a plane of the patterned substrate, wherein a response to the illumination supplied along the first axis is differentiable from a response to the illumination supplied along the second axis and a defect classifier operative to receive the at least one image and to distinguish therewithin a candidate defect caused by a cut or a candidate defect caused by excess material, from one another and/or from other types of candidate defects.


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