The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 7391495 B1

PDF
Full Text
Expired
Date of Patent:
Jun. 24, 2008

Filed:

Apr. 08, 2004
Applicants:

Yoshikazu Miyajima, Tochigi, JP;

Yasuhito Sasaki, Tochigi, JP;

Hitoshi Sato, Tochigi, JP;

Inventors:

Yoshikazu Miyajima, Tochigi, JP;

Yasuhito Sasaki, Tochigi, JP;

Hitoshi Sato, Tochigi, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03B 27/52 (2006.01); G03B 27/42 (2006.01);
U.S. Cl.
CPC ...
Abstract

A stage apparatus includes a base having a reference surface, a moving unit which moves along the reference surface, a static bearing which is provided in the moving unit and which supports the moving unit such that the moving unit can move along the reference surface, and a temperature controller which is provided in the moving unit and which controls the temperature of gas supplied to the static bearing. In the stage apparatus, air fluctuation in the measurement area of interferometers due to gas exhausted from the static bearing and/or distortion caused by heat transmitted to a retainer of a target is suppressed, and the stage positioning accuracy is thereby increased.


Find Patent Forward Citations

Miyajima, Yoshikazu. (2008). Stage apparatus, exposure system using the same, and device manufacturing method (U.S. Patent No. 7391495). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/7391495

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