The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 7390614 B1

PDF
Full Text
Expired
Date of Patent:
Jun. 24, 2008

Filed:

Mar. 29, 2005
Applicants:

Johannes G. Gijsbertsen, Delft, NL;

Pieter W. H. DE Jager, Rotterdam, NL;

Michiel D. Nijkerk, Amsterdam, NL;

Inventors:

Johannes G. Gijsbertsen, Delft, NL;

Pieter W. H. De Jager, Rotterdam, NL;

Michiel D. Nijkerk, Amsterdam, NL;

Assignee:

ASML Netherlands B.V., Veldhoven, NL;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G03F 9/00 (2006.01); G03F 7/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

A lithographic projection apparatus includes an alignment sensor having an electron beam source constructed and arranged to provide an electron beam for impinging on an alignment marker on a substrate, and a back-scattered electron detector constructed and arranged to detect electrons back-scattered from the alignment marker. The alignment sensor is independent of the projection system and projection radiation, and is an off-axis alignment sensor.


Find Patent Forward Citations

Gijsbertsen, Johannes. (2008). Lithographic apparatus and device manufacturing method (U.S. Patent No. 7390614). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/7390614

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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