The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 7390429 B1

PDF
Full Text
Expired
Date of Patent:
Jun. 24, 2008

Filed:

Dec. 19, 2005
Applicants:

Feng Q. Liu, San Jose, CA (US);

Tianbao Du, Santa Clara, CA (US);

Alain Duboust, Sunnyvale, CA (US);

Wei-yung Hsu, Sunnyvale, CA (US);

Inventors:

Feng Q. Liu, San Jose, CA (US);

Tianbao Du, Santa Clara, CA (US);

Alain Duboust, Sunnyvale, CA (US);

Wei-Yung Hsu, Sunnyvale, CA (US);

Assignee:

Applied Materials, Inc., Santa Clara, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C09K 13/00 (2006.01); C09K 13/04 (2006.01); C09K 13/06 (2006.01);
U.S. Cl.
CPC ...
Abstract

A method of processing a substrate having a conductive material layer disposed thereon is provided which includes positioning the substrate in a process apparatus and supplying a first polishing composition between to the substrate. The polishing composition comprises a first chelating agent, a second chelating agent, a first corrosion inhibitor, a second corrosion inhibitor, a suppressor, a solvent, and an inorganic acid based electrolyte to provide a pH between about 3 and about 10.


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