The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 10, 2008

Filed:

Aug. 30, 2005
Applicant:

Johannes Adrianus Antonius Theodorus Dams, Veldhoven, NL;

Assignee:

ASML Netherlands B.V., Veldhoven, NL;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03B 27/62 (2006.01); G03B 27/58 (2006.01); H02K 41/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

A lithographic apparatus is arranged to transfer a pattern from a patterning device onto a substrate and includes an electromagnetic actuator to actuate a part of the lithographic apparatus in a linear direction or in a rotational direction. The actuator has a substantially stationary part and a movable part interacting with each other. The stationary part has a plurality of coils and a magnetic circuit of magnetizable material, and the movable part has a magnet system. The magnet system has an array of magnets forming a magnet array having opposite ends. The magnet array has an array of primary magnets and an array of subsidiary magnets alternating with the primary magnets. A direction of polarization of an end primary magnet at an end position of the array of primary magnets differs from a direction of polarization of an intermediate primary magnet at an intermediate position between the end primary magnets.


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