The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 10, 2008
Filed:
Jan. 06, 2006
Yoshifumi Taniguchi, Hitachinaka, JP;
Mikio Ichihashi, Nagoya, JP;
Masanari Kouguchi, Kunitachi, JP;
Yoshifumi Taniguchi, Hitachinaka, JP;
Mikio Ichihashi, Nagoya, JP;
Masanari Kouguchi, Kunitachi, JP;
Hitachi, Ltd., Tokyo, JP;
Abstract
A method and apparatus for measuring the physical properties of a micro region measures the two-dimensional distribution of stress/strain in real time at high resolution and sensitivity and with a high level of measuring position matching. A sample is scanned and irradiated with a finely focused electron beam (), and the displacement of position of a diffraction spot () is measured by a two-dimensional position-sensitive electron detector (). The displacement amount is outputted as a voltage value that is then converted into the magnitude of the stress/strain according to the principle of a nano diffraction method, and the magnitude is displayed in synchronism with a sample position signal.