The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 03, 2008
Filed:
Mar. 14, 2006
Dong Niu, Tualatin, OR (US);
Haiying Fu, West Linn, OR (US);
Brian LU, Fremont, CA (US);
Feng Wang, Fremont, CA (US);
Dong Niu, Tualatin, OR (US);
Haiying Fu, West Linn, OR (US);
Brian Lu, Fremont, CA (US);
Feng Wang, Fremont, CA (US);
Novellus Systems, Inc., San Jose, CA (US);
Abstract
Methods for improving the mechanical properties of a CDO film are provided. The methods involve, for instance, providing either a dense CDO film or a porous CDO film in which the porogen has been removed followed by curing the CDO film at an elevated temperature using either a UV light treatment, an e-beam treatment, or a plasma treatment such that the curing improves the mechanical toughness of the CDO dielectric film.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile