The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 03, 2008
Filed:
Aug. 15, 2005
Igor Jekauc, Richmond, VA (US);
Igor Jekauc, Richmond, VA (US);
Infineon Technologies Richmond, LP., Sandston, VA (US);
Abstract
A method for monitoring precision of placement of semiconductor wafers in a semiconductor processing apparatus includes measuring thickness of an insulating film on a surface of a semiconductor substrate before etching a portion of the insulating film from the surface of the semiconductor substrate. The method further includes re-measuring the thickness of the insulating film to determine etch rates for the film at selected locations on the surface of the semiconductor wafer, and based on the determined etch rates, determining misalignment of the semiconductor wafer.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile