The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 03, 2008

Filed:

Nov. 29, 2004
Applicants:

Shujiroh Uesaka, Yasugi, JP;

Gang Han, Yonago, JP;

Eiji Hirakawa, Higashiizumo, JP;

Inventors:

Shujiroh Uesaka, Yasugi, JP;

Gang Han, Yonago, JP;

Eiji Hirakawa, Higashiizumo, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B22F 9/14 (2006.01);
U.S. Cl.
CPC ...
Abstract

A plasma processing apparatus for powder, and a plasma processing method of powder, in which a powder supply nozzle is provided to supply a powder material into plasma flame generated inside a high-frequency coil, the powder supply nozzle arranged substantially radially centrally of the high-frequency coil comprises a revolving flow forming device, for example, a spiral-shaped plate, to cause a carrier gas and the powder material to form therein a revolving flow with an axis thereof directed axially of the high-frequency coil, and the revolving flow is discharged from an outlet at an end of the nozzle. More preferably, a transition space is provided between the outlet at the end of the nozzle and the revolving flow forming device, and the outlet at the end of the nozzle is made small in diameter.


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